LG80-200 pipeline booster pump

1. Basic specifications

models:

LG: vertical pipeline booster pump (L vertical, G pipeline)

80: inlet diameter 80mm (DN80)

200: impeller nominal diameter 200mm Type: single-stage single-suction

centrifugal pump Standard: GB/T5656 (equivalent to ISO2858)

2.Performance parameters

parámetro	Scope of indicators
Flow  (Q)	30-60m³/h
Head (H)	45-55m
rotational speed	2900r/min (2-pole motor)
efficiency	6572%
Required cavitation allowance	3.0-4.0m

3.Structural design

Pump body material:

Standard:HT200 cast iron

Optional: 304/316L stainless steel (corrosion resistant)

Impeller: Closed structure (dynamic balance G6.3 level)

Material:cast iron/bronze (optional)

Shaft seal:

Standard:mechanical seal (Si/graphite pairing)

Optional: double end face seal (suitable for corrosive media)

3.Power configuration

Matching motor:

 Power:15-22kW (selected according to working conditions)

Protection level: IP55

Insulation level: F level

Transmission mode: direct coupling

5.Installation parameters

Item	Dimensions (mm)
center height	250
Inlet outlet flange	GB/T9113 PN16
Foot spacing	500×400
Overall length	≈850

6.Operation limit

Medium temperature: ≤80℃(high temperature type can reach 120℃)

Working pressure:1.0MPa

Solid content: ≤0.1% (clean water standard)

7.Selection and expansion

Special configuration:

Variable frequency motor(energy-saving adjustment)

Full set of stainless steel materials (food/pharmaceutical grade)

Explosion-proof motor (Ex dⅡ BT4)

Typical application scenarios

1. Building water supply system (high-rise building booster)

2. Industrial circulating water (cooling water delivery)

3.Fire water supply (pressure stabilization system)

4. Air conditioning system (chilled water circulation)

(Note: The actual selection needs to check the pipeline characteristic curve, and it is recommended to retain a 10% flow margin) If a performance curve (QH) or a material corrosion resistance test report is required, please explain the specific working conditions (such as medium composition, operating environment, etc.).